{"title":"Design for Environment in New Semiconductor Manufacturing Technologies","authors":"J. Harland, D. Harman, L. Drago","doi":"10.1109/ISEE.2007.369373","DOIUrl":null,"url":null,"abstract":"In this paper, we provide data on the environmental performance improvements achieved during the conversion from manufacturing semiconductors on 200 mm silicon wafer to manufacturing on 300 mm. Conclusions identify approaches to continue the environmental improvements in future manufacturing generations.","PeriodicalId":275164,"journal":{"name":"Proceedings of the 2007 IEEE International Symposium on Electronics and the Environment","volume":"54 6","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2007 IEEE International Symposium on Electronics and the Environment","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISEE.2007.369373","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
In this paper, we provide data on the environmental performance improvements achieved during the conversion from manufacturing semiconductors on 200 mm silicon wafer to manufacturing on 300 mm. Conclusions identify approaches to continue the environmental improvements in future manufacturing generations.
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