S. Y. Ku, T. Lo, Y. Shih, C. Shi, C.H. Wang, Y.J. Yu
{"title":"Pre-metal clean optimization for cluster defect prevention","authors":"S. Y. Ku, T. Lo, Y. Shih, C. Shi, C.H. Wang, Y.J. Yu","doi":"10.1109/ISSM.2001.963024","DOIUrl":null,"url":null,"abstract":"Pre-metal clean is a critical procedure before the metal loop in the salicide process. Surface defects such as the surface native oxide or any other contamination may result in a poor adhesion of Ti/TiN, for example, and hence the poor salicide formation. HF treatment with IPA dry is a widely used methodology for surface defect removal, and results in a clean surface which is water spot free and has less chemical oxide. However, a cluster type defect is an accompaniment of this treatment in the salicide process. The aim of this work is to provide an optimized cleaning procedure at pre-metal clean for mass production.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.963024","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Pre-metal clean is a critical procedure before the metal loop in the salicide process. Surface defects such as the surface native oxide or any other contamination may result in a poor adhesion of Ti/TiN, for example, and hence the poor salicide formation. HF treatment with IPA dry is a widely used methodology for surface defect removal, and results in a clean surface which is water spot free and has less chemical oxide. However, a cluster type defect is an accompaniment of this treatment in the salicide process. The aim of this work is to provide an optimized cleaning procedure at pre-metal clean for mass production.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
