Characteristics of plasma process in explosive electron emission

Abstract

Cathode Plasma is a basic phenomenon in explosive electron emission (EEE). This paper addresses the plasma characteristics of annular explosive emission cathodes (EECs) with a framing camera. The plasma photographs show that the plasma development proceeds slower than the electron emission process and has a significant persistence effect which makes the cathode plasma need several microseconds to dissipate thoroughly after the high-voltage pulse. The photographs also show that the guiding magnetic field and cathode material have significant influences on emission uniformity of EECs.