Electron Beam-plasma Vacuum Deposition of Very Thin Carbon Films: Photocathode Application

J. Huran, A. Skrypnik, V. Dujnič, A. Doroshkevich, B. Zat’ko, M. Nozdrin, E. Kováčová, G. Shirkov
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Abstract

Very thin carbon films were deposited by electron beam-plasma vacuum deposition technique on quartz and sapphire substrates. The concentration of elements was determined by RBS and ERD analytical method simultaneously. Concentrations of elements were practically the same for all samples. Raman spectroscopy and deconvolution of Raman spectra was used for chemical structural features determination of carbon films. Raman spectroscopy results showed that films contained several carbon phases. The photo-induced electron emission characteristics of very thin carbon films on quartz and sapphire substrates as back-side illuminated transmission photocathode are discussed. Best electron emission properties exhibit transmission photocathode with very thin carbon film prepared on sapphire substrate at lower substrate temperature.
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电子束等离子体真空沉积超薄碳膜:光电阴极应用
采用电子束等离子体真空沉积技术在石英和蓝宝石衬底上沉积了极薄的碳膜。采用RBS法和ERD法同时测定样品中元素的浓度。所有样品的元素浓度几乎相同。采用拉曼光谱法和拉曼反褶积法测定了碳膜的化学结构特征。拉曼光谱结果表明,薄膜中含有多个碳相。讨论了石英和蓝宝石衬底上极薄碳薄膜作为背侧发光透射光电阴极的光致电子发射特性。在较低的衬底温度下,在蓝宝石衬底上制备极薄碳膜的透射式光电阴极具有最佳的电子发射性能。
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