Characterization of systematic process variation in a silicon photonic platform

Nicholas A. Boynton, A. Pomerene, A. Starbuck, A. Lentine, C. DeRose
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引用次数: 4

Abstract

We present a quantitative analysis of the correlation of resonant wavelength variation with process variables, and find that 50% of the resonant wavelength variation for microrings is due to systematic process conditions. We also discuss the improvement of device uniformity by mitigating these systematic variations.
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硅光子平台系统工艺变化的表征
我们对谐振波长变化与工艺变量的相关性进行了定量分析,发现微环谐振波长变化的50%是由系统工艺条件引起的。我们还讨论了通过减轻这些系统变化来改善器件均匀性的问题。
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