{"title":"Polarization-dependent Talbot effect with variable duty cycle","authors":"Shubin Li, Changhe Zhou, G. Barbastathis","doi":"10.1109/OMN.2014.6924584","DOIUrl":null,"url":null,"abstract":"It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.","PeriodicalId":161791,"journal":{"name":"2014 International Conference on Optical MEMS and Nanophotonics","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 International Conference on Optical MEMS and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMN.2014.6924584","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.
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