The Influence of Photoinitiator Concentration on the Two-Photon Polymerization Threshold of Pentaerythritol Triacrylate (PETIA) Monomer

S. Mckee, A. Lutey, C. Sciancalepore, F. Poli, S. Selleri, A. Cucinotta
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Abstract

As an important three-dimensional (3D) microfabrication technique, two-photon polymerization has attracted much interest in scientific sectors due to its ability to fabricate sophisticated 3D structures with dimensions beyond the diffraction limit using diverse materials. In this work, the interaction between 80 femtosecond laser pulses generated with an Ytterbium-doped Potassium Gadolinium Tungstate (Yb:KGW) laser source and a transparent negative photoresist is comprehensively investigated. The results confirm that the photoinitiator concentration directly affects the range of acceptable average laser power, from the polymerization threshold up to the damage threshold, and subsequently the integrity of manufactured structures.
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光引发剂浓度对季戊四醇三丙烯酸酯单体双光子聚合阈值的影响
双光子聚合作为一种重要的三维微加工技术,由于其能够使用多种材料制造出尺寸超过衍射极限的复杂三维结构,引起了科学界的广泛关注。本文全面研究了掺镱钨酸钆钾(Yb:KGW)激光源产生的80飞秒激光脉冲与透明负光刻胶之间的相互作用。结果证实,光引发剂浓度直接影响可接受的平均激光功率范围,从聚合阈值到损伤阈值,以及随后的制造结构的完整性。
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