High performance microwave air-bridge resonators

C. Seabury, J. Cheung, P. Kobrin, R. Addison, D. P. Havens
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引用次数: 20

Abstract

We have used pulsed laser deposition and a dry release process to produce freestanding zinc oxide films for bulk mode microwave acoustic resonators. Laser assisted deposition is used to produce ZnO films with very low (slightly tensile) stress at temperatures below 200/spl deg/C. They have a high degree of orientation, C axis X-ray 1/2 width /spl sim/0.24/spl deg/, resistivity greater than 10/sup 10/ ohm cm and loss tangent below 0.01 at 10 MHz. Resonators with Qs of over 350 with K/sub em/ of 0.22 at 1.5 GHz have been produced. An air-bridge process has been used to produce undistorted freestanding membranes up to 400 /spl mu/m sq., with single mode resonance characteristics. The use of an inorganic sacrificial layer and a dry release etch avoids the problem of surface tension that occurs in wet chemical etching, resulting in high yield. The process also allows for on-wafer frequency trimming. Multipole band pass filters have been designed based on the discrete resonator results, and have been fabricated using this process. A rejection of 28 dB and an insertion loss of -7 dB have been achieved. The high yield and good uniformity make this a practical, low-cost process for producing complex multipole filter structures suitable for 1-3 GHz mobile communications.
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高性能微波气桥谐振器
我们使用脉冲激光沉积和干释放工艺生产了用于体模微波声学谐振器的独立式氧化锌薄膜。激光辅助沉积用于在低于200/spl℃的温度下生产具有非常低(微拉伸)应力的ZnO薄膜。它们具有很高的取向度,C轴x射线1/2宽度/spl sim/0.24/spl度/,电阻率大于10/sup 10/欧姆cm,损耗正切在10 MHz下低于0.01。已经生产出了q超过350,K/sub em/为0.22的1.5 GHz谐振器。空气桥工艺已被用于生产不变形的独立膜,最高可达400 /spl mu/m sq。,具有单模共振特性。使用无机牺牲层和干释放蚀刻避免了湿化学蚀刻中出现的表面张力问题,从而获得高收率。该工艺还允许晶圆上的频率微调。基于离散谐振器的结果设计了多极带通滤波器,并采用该工艺制作了多极带通滤波器。抑制值为28 dB,插入损耗为-7 dB。高产量和良好的均匀性使其成为一种实用的低成本工艺,用于生产适用于1-3 GHz移动通信的复杂多极滤波器结构。
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