Predominant Scattering Mechanisms in Quaternary AlInGaN/GaN Heterostructures

R. Tülek, S. Gökden, A. Teke, E. Arslan, E. Özbay
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Abstract

Scattering mechanisms that limit the mobility of two-dimensional electron gas (2DEG) in AlInGaN/GaN heterojunctions with three different barrier layer thicknesses of 37.2 (sample A), 10.6 (sample B) and 4.30 (sample C) nm were studied. Hall measurements were performed between 12 and 350 K. Mobilities limited by scattering due to acoustic and optic phonons, dislocation, interface roughness, and alloy disorder were used in the calculation. It was found that scattering, predominantly due to interface roughness, determine the Hall mobility for all samples at different strengths. The highest electron mobility of 492 cm2V-1s-1 at room temperature is obtained for sample B with a high sheet density of about 4.43x1013 cm-2 and a corresponding sheet resistance of 287 Ω/.
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第四纪AlInGaN/GaN异质结构的主要散射机制
研究了具有37.2 nm(样品A)、10.6 nm(样品B)和4.30 nm(样品C)三种阻挡层厚度的AlInGaN/GaN异质结中限制二维电子气(2DEG)迁移率的散射机制。霍尔测量在12 ~ 350 K之间进行。计算中使用了声光声子散射、位错、界面粗糙度和合金无序性所限制的迁移率。结果发现,散射(主要是由于界面粗糙度)决定了不同强度下所有样品的霍尔迁移率。样品B在室温下的电子迁移率最高,为492 cm2V-1s-1,片密度约为4.43x1013 cm-2,片电阻为287 Ω/。
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