Photoplastic SU-8 probes for near-field optical applications

Abstract

We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications.