{"title":"Advanced Sputtering Technologies of Flexible Hard Nanocoatings","authors":"J. Musil, Š. Kos","doi":"10.1201/9781003088349-1","DOIUrl":null,"url":null,"abstract":"The chapter describes sputtering technologies of flexible hard nanocoatings based\n on strongly non-equilibrium processes at an atomic level. Six technologies are\n briefly described: (1) The low-temperature sputtering of coatings, (2) the\n sputtering of beta-phase coatings, (3) the sputtering of superhard metallic\n coatings, (4) the sputtering of transition metal (TM) overstoichiometric nitride\n and dinitride coatings, (5) the sputtering of heterostructural alloy coatings, and\n (6) the hardness of hard nanocoatings. At the end, the present state of knowledge\n in this field is summarized and the trends of next development are indicated.","PeriodicalId":384772,"journal":{"name":"Protective Thin Coatings Technology","volume":"79 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Protective Thin Coatings Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1201/9781003088349-1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The chapter describes sputtering technologies of flexible hard nanocoatings based
on strongly non-equilibrium processes at an atomic level. Six technologies are
briefly described: (1) The low-temperature sputtering of coatings, (2) the
sputtering of beta-phase coatings, (3) the sputtering of superhard metallic
coatings, (4) the sputtering of transition metal (TM) overstoichiometric nitride
and dinitride coatings, (5) the sputtering of heterostructural alloy coatings, and
(6) the hardness of hard nanocoatings. At the end, the present state of knowledge
in this field is summarized and the trends of next development are indicated.
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