Structure of Ta/TaN Nanolayered Systems Investigated by Transmission Electron Microscopy

Abstract

One of the most important challenges of modern materials engineering is to improve the efficiency and durability of materials, which directly translates into reducing the consumption of raw materials. In many applications, these goals are achieved by strengthening and functionalizing the surface, especially in the case of nanocoatings. The material for the study is the Ta/TaN multilayer systems obtained with the ALD technique (Atomic Layer Deposition, R200 by Picosun). For their structure characterisation electron microscopy (HR STEM, electron diffraction, EDS, EELS) was used. Geometrical parameters (thickness of the constituent Ta and TaN layers, ratio of thicknesses of metallic and ceramic layers) were determined, and their chemical and phase compositions were verified. The obtained results will be used to model mechanical properties and interpret the results of experimental nanoindentation measurements.