{"title":"Setting Time, Compressive Strength and Photon Attenuation Properties of Cement Mortars Produced with Nano-SiO2","authors":"Namık Yaltay","doi":"10.53433/yyufbed.1329695","DOIUrl":null,"url":null,"abstract":"In this study, initial and final setting time, compressive strength and photon attenuation properties of cement mortar samples produced with 0.5%, 1%, 2%, and 4% nanoscale SiO2 addition were investigated. For this purpose, cement mortar samples were prepared and cured for 1, 2, 7, 28, and 90 days. Increases in compressive strength values were observed in the early curing ages, with a slight decrease of 3,17% and 0,33% for low nano SiO2 rates (0.5% and 1%) in later ages. In addition, these results were evaluated with Scanning Electron Microscope (SEM) images. In the samples added 4% nano-SiO2, there was a 13.3% and 9.09% reduction in the initial and final setting times, respectively. Furthermore, mass attenuation coefficients were compared for different cure ages.","PeriodicalId":386555,"journal":{"name":"Yüzüncü Yıl Üniversitesi Fen Bilimleri Enstitüsü Dergisi","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2023-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Yüzüncü Yıl Üniversitesi Fen Bilimleri Enstitüsü Dergisi","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.53433/yyufbed.1329695","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, initial and final setting time, compressive strength and photon attenuation properties of cement mortar samples produced with 0.5%, 1%, 2%, and 4% nanoscale SiO2 addition were investigated. For this purpose, cement mortar samples were prepared and cured for 1, 2, 7, 28, and 90 days. Increases in compressive strength values were observed in the early curing ages, with a slight decrease of 3,17% and 0,33% for low nano SiO2 rates (0.5% and 1%) in later ages. In addition, these results were evaluated with Scanning Electron Microscope (SEM) images. In the samples added 4% nano-SiO2, there was a 13.3% and 9.09% reduction in the initial and final setting times, respectively. Furthermore, mass attenuation coefficients were compared for different cure ages.
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