The neutrophil-to-Lymphocyte ratio is associated with clinical symptoms in first-episode medication-naïve patients with schizophrenia

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-02-03 DOI:10.1038/s41537-024-00437-5
Xuan Wang, Xiaofang Chen, Xiaoni Guan, Zezhi Li
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Abstract

Innate immunity has been shown to be associated with schizophrenia (Sch). This study explored the relationship between symptoms and neutrophil-to-lymphocyte ratio (NLR) (a marker of innate immunity) in patients with Sch. Ninety-seven first-episode medication-naïve (FEMN) patients with Sch and 65 healthy controls were recruited in this study. We measured the complete blood count and assessed the clinical symptoms using the PANSS scales. We found higher NEU counts and NLR in patients with Sch compared with control subjects. Male patients showed a higher NEU count than female patients. In addition, FEMN patients with higher NLR and NEU values showed higher PANSS-p, PANSS-g, and PANSS-total scores (all p < 0.05). Regression analysis revealed that NLR was a predictor for PANSS total scores in patients with Sch. Higher NLR value was observed in patients with Sch and the significant associations between NLR and psychotic symptoms indicate that an imbalance in inflammation and innate immune system may be involved in the pathophysiology of Sch.

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中性粒细胞与淋巴细胞比值与初次发病、未经药物治疗的精神分裂症患者的临床症状有关
先天性免疫已被证明与精神分裂症(Sch)有关。本研究探讨了精神分裂症患者的症状与中性粒细胞对淋巴细胞比率(NLR)(一种先天性免疫标志物)之间的关系。我们测量了全血细胞计数,并使用 PANSS 量表评估了临床症状。我们发现,与对照组相比,Sch 患者的近极细胞计数和 NLR 均较高。男性患者的NEU计数高于女性患者。此外,NLR和NEU值较高的FEMN患者的PANSS-p、PANSS-g和PANSS-总分也较高(所有P均为0.05)。回归分析表明,NLR 是预测 Sch 患者 PANSS 总分的一个指标。Sch 患者的 NLR 值较高,NLR 与精神症状之间的显著相关性表明,炎症和先天性免疫系统失衡可能与 Sch 的病理生理学有关。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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