Sputtering thin films: Materials, applications, challenges and future directions

IF 15.9 1区 化学 Q1 CHEMISTRY, PHYSICAL Advances in Colloid and Interface Science Pub Date : 2024-05-22 DOI:10.1016/j.cis.2024.103203
Renuka Garg , Spandana Gonuguntla , Saddam Sk , Muhammad Saqlain Iqbal , Adewumi Oluwasogo Dada , Ujjwal Pal , Mohsen Ahmadipour
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Abstract

Sputtering is an effective technique for producing ultrathin films with diverse applications. The review begins by providing an in-depth overview of the background, introducing the early development of sputtering and its principles. Consequently, progress in advancements made in recent decades highlights the renaissance of sputtering as a powerful technology for creating thin films with varied compositions, structures, and properties. For the first time, we have discussed a thorough overview of several sputtered thin film materials based on metal and metal oxide, metal nitride, alloys, carbon, and ceramic-based thin film along with their properties and their applicability in various fields. We further delve into the applications of sputter-coated thin films, specifically emphasizing their relevance in environmental sustainability, energy and electronics, and biomedical fields. We critically examine the recent advancements in developing sputter-coated catalysts for eliminating water pollutants andhydrogen generation. Additionally, the review sheds light on advantages, shortcomings, and future directions for developing sputter-coated thin films utilized in biodegradable metals and alloys with enhanced corrosion resistance and biocompatibility. This review is a comprehensive integration of recent literature, covering diverse sputtering thin film applications. We delve deeply into various material types and emphasize critical analysis of recent advancements, particularly in environmental, energy, and biomedical fields. By offering insights into both advancements and limitations, the review provides a nuanced understanding essential for practical utilization.

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溅射薄膜:材料、应用、挑战和未来方向
溅射是一种生产超薄薄膜的有效技术,应用广泛。本综述首先对背景进行了深入概述,介绍了溅射技术的早期发展及其原理。随后,近几十年来所取得的进步凸显了溅射技术的复兴,它是制造具有不同成分、结构和特性的薄膜的强大技术。我们首次全面介绍了几种基于金属和金属氧化物、金属氮化物、合金、碳和陶瓷的溅射薄膜材料,以及它们的特性和在各个领域的应用。我们将进一步深入探讨溅射涂层薄膜的应用,特别强调其在环境可持续性、能源和电子以及生物医学领域的相关性。我们认真研究了最近在开发用于消除水污染物和制氢的溅射涂层催化剂方面取得的进展。此外,这篇综述还阐明了开发可生物降解金属和合金用溅射涂层薄膜的优势、不足和未来方向,这些薄膜具有更强的耐腐蚀性和生物相容性。本综述全面整合了最新文献,涵盖了各种溅射薄膜应用。我们深入探讨了各种材料类型,并强调了对最新进展的批判性分析,尤其是在环境、能源和生物医学领域。本综述深入探讨了各种材料类型,并着重对最新进展进行了批判性分析,尤其是在环境、能源和生物医学领域的应用。
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来源期刊
CiteScore
28.50
自引率
2.60%
发文量
175
审稿时长
31 days
期刊介绍: "Advances in Colloid and Interface Science" is an international journal that focuses on experimental and theoretical developments in interfacial and colloidal phenomena. The journal covers a wide range of disciplines including biology, chemistry, physics, and technology. The journal accepts review articles on any topic within the scope of colloid and interface science. These articles should provide an in-depth analysis of the subject matter, offering a critical review of the current state of the field. The author's informed opinion on the topic should also be included. The manuscript should compare and contrast ideas found in the reviewed literature and address the limitations of these ideas. Typically, the articles published in this journal are written by recognized experts in the field.
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