Effect of Argon in Nitrogen Gliding Arc Plasma for Ammonium Ions Enrichment in Water

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2024-05-28 DOI:10.1007/s11090-024-10473-9
Indumathy Balakrishnan, Ananthanarasimhan Jayanarasimhan, Lakshminarayana Rao, Suraj Kumar Sinha, Yugeswaran Subramaniam
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Abstract

This work investigates the effect of Ar addition on N2 gliding arc plasma to enhance ammonium ions concentration in water. The concentration of ammonium ion \(\left({\text{N}\text{H}}_{4}^{+}\right)\) increased by 50.2% when Ar gas was added upto 40% by volume to the N2 gliding arc plasma, thus indicating the significant contribution of Ar in \({\text{N}\text{H}}_{4}^{+}\) synthesis. Adding 20% Ar in N2 resulted in a maximum \({ \text{N}\text{H}}_{4}^{+}\) concentration of 16.5 ppm and a production rate of 1.31 mg hr-1. While adding 40% Ar into N2 plasma, the highest energy efficiency of 0.036 g-\({\text{N}\text{H}}_{4}^{+}\)KWh−1was obtained with a specific energy input of 742.5 J/L. The mechanisms of \({ \text{N}\text{H}}_{4}^{+}\) enrichment with Ar addition were investigated by studying the electrical properties, vibrational, rotational and electron temperature of the gliding arc plasma with respect to the addition of Ar concentration in N2 plasma. Results show that the addition of Ar raises the vibrational and electron temperatures, and decreases the rotational temperature of the gliding arc plasma. (As per the reviewer-2 suggestion, this line has been removed from the abstract). Particularly, the presence of 26.5% Ar by volume in N2 plasma results in a significant ion current, which generates high ionization of \({\text{N}}_{2}^{+}\).

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氮滑弧等离子体中的氩对水中铵离子富集的影响
这项工作研究了在 N2 滑翔弧等离子体中添加 Ar 以提高水中铵离子浓度的效果。当在 N2 滑翔电弧等离子体中加入高达 40% 体积的 Ar 气体时,铵离子的浓度增加了 50.2%,这表明了 Ar 在合成中的重要作用。在 N2 中添加 20% 的 Ar 会导致最大 \({\{N}\text{H}}_{4}^{+}\) 浓度达到 16.5 ppm,生产率达到 1.31 mg hr-1。在 N2 等离子体中加入 40% 的 Ar 时,能量效率最高,为 0.036 g-({text{N}\text{H}}_{4}^{+})KWh-1,比能量输入为 742.5 J/L。通过研究滑弧等离子体的电学特性、振动、旋转和电子温度与 N2 等离子体中添加 Ar 浓度的关系,研究了添加 Ar 后 \({text{N}\text{H}}_{4}^{+}\) 富集的机理。结果表明,添加 Ar 会提高滑行弧等离子体的振动温度和电子温度,降低旋转温度。(根据审稿人-2 的建议,这一行已从摘要中删除)。特别是,在 N2 等离子体中存在体积分数为 26.5% 的 Ar 时,会产生很大的离子电流,从而使 \({\text{N}}_{2}^{+}\)高度电离。
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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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