A study on sheath structure in discharge and diffusion region of a double plasma device

Abstract

The article reports about the variation of an ion sheath thickness in discharge and diffusion plasma. Two ion sheaths are formed at two negatively biased plates placed in discharge and diffusion region of a double plasma device. Plasma is only produced in one section of the device by hot filament discharge and there is no filament in the other section. When energy of primary electrons is increased, ion sheath in discharge region expands and it contracts in the diffusion region. For an increase in population of primary electrons, an ion sheath in both discharge and diffusion region contracts. Again, for drainage of electrons or ions from discharge region, the sheath structure in discharge region is highly influenced by the plasma potential whereas in diffusion region; sheath structure is mainly influenced by local plasma density.