Electrodeposition of Copper-Silver Alloys from Aqueous Solutions: A Prospective Process for Miscellaneous Usages

Compounds Pub Date : 2024-07-08 DOI:10.3390/compounds4030028
Sofya Efimova, F. Lazar, J. Chopart, François Debray, A. Daltin
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Abstract

The electrodeposition of copper (Cu), silver (Ag), and their alloys has been a subject of interest since the 19th century. Primarily due to their exceptional features such as good mechanical hardness and electrical conductivity, high resistance to corrosion, and electromigration, Cu–Ag electrodeposits continue to be investigated and developed to improve their properties for different applications. This paper reviews the state of the art in the field of electroplated Cu–Ag alloys in an aqueous solution, with particular emphasis on the observed properties and variety of electrochemical processes used to produce high-quality materials. Moreover, this review paper focuses on the experimental conditions employed for Cu–Ag electrodeposition, intending to understand the basis and manipulate the processes to obtain coatings with superior characteristics and for attractive usage. Finally, the most trending applications of these coatings are discussed depending on different parameters of electrodeposition to provide prospects for potential research.
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从水溶液中电沉积铜银合金:多种用途的前瞻性工艺
自 19 世纪以来,铜(Cu)、银(Ag)及其合金的电沉积一直是人们关注的主题。铜银电解沉积物具有良好的机械硬度和导电性、高耐腐蚀性和电迁移性等优异特性,因此,人们不断研究和开发铜银电解沉积物,以提高其在不同应用领域的性能。本文回顾了在水溶液中电镀铜银合金领域的最新研究成果,特别强调了所观察到的特性以及用于生产高质量材料的各种电化学工艺。此外,本文还重点介绍了铜银电沉积的实验条件,目的是了解电沉积的基础和操作过程,以获得具有优异特性和吸引力的涂层。最后,根据电沉积的不同参数,讨论了这些涂层的最新应用趋势,为潜在研究提供了前景。
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