A. A. Samokhvalov, K. A. Sergushichev, S. I. Eliseev, T. P. Bronzov, E. P. Bolshakov, D. V. Getman, A. A. Smirnov
{"title":"Optimization of Parameters of a Compact Soft X-Ray Source for Operation in the Wavelength Range 2–5 nm","authors":"A. A. Samokhvalov, K. A. Sergushichev, S. I. Eliseev, T. P. Bronzov, E. P. Bolshakov, D. V. Getman, A. A. Smirnov","doi":"10.1134/s106378422401033x","DOIUrl":null,"url":null,"abstract":"<h3 data-test=\"abstract-sub-heading\">Abstract</h3><p>This paper presents a compact source of soft X-ray radiation for operation in the wavelength range of 2–5 nm with a pulse repetition frequency of more than 500 Hz. The source parameters were optimized to reduce the intensity of ablation of the discharge volume wall and obtain the maximum intensity of the spectral lines of multicharged ions CV—4 nm and Ar IX—4.87 nm. The obtained results can be used in the development of a microscope for the tasks of cell transmission microscopy with nanometer resolution.</p>","PeriodicalId":783,"journal":{"name":"Technical Physics","volume":null,"pages":null},"PeriodicalIF":1.1000,"publicationDate":"2024-09-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Physics","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1134/s106378422401033x","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0
Abstract
This paper presents a compact source of soft X-ray radiation for operation in the wavelength range of 2–5 nm with a pulse repetition frequency of more than 500 Hz. The source parameters were optimized to reduce the intensity of ablation of the discharge volume wall and obtain the maximum intensity of the spectral lines of multicharged ions CV—4 nm and Ar IX—4.87 nm. The obtained results can be used in the development of a microscope for the tasks of cell transmission microscopy with nanometer resolution.
期刊介绍：
Technical Physics is a journal that contains practical information on all aspects of applied physics, especially instrumentation and measurement techniques. Particular emphasis is put on plasma physics and related fields such as studies of charged particles in electromagnetic fields, synchrotron radiation, electron and ion beams, gas lasers and discharges. Other journal topics are the properties of condensed matter, including semiconductors, superconductors, gases, liquids, and different materials.
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