Probing half-metallicity in Mn2CoSi/Si(100) thin film structures using electrical transport measurements towards spintronic applications

IF 4.3 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY Journal of Physics and Chemistry of Solids Pub Date : 2024-10-16 DOI:10.1016/j.jpcs.2024.112391
Anadi Krishna Atul , Indra Sulania , R.J. Choudhary , Neelabh Srivastava
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Abstract

The structural, magnetic, and electronic transport properties of Mn₂CoSi (MCS) thin film have been studied to explore the possibility of half-metallicity of MCS Heusler alloy (HA) in thin film form. Grazing incidence X-ray diffraction (GIXRD) data indicated the presence of the rhombohedral crystal structure with a space group of R 3 (148). Spectrum fitting of X-ray reflectivity (XRR) suggests the deposited film has smooth surface with uniform density. Magnetic analysis reveals the ferrimagnetic nature of the film with a transition temperature well above the room temperature. Electric transport study of MCS thin film indicates the non-metallic behavior (< 250 K) and metallic behavior (> 250 K) in different temperature regimes. The persistence of half-metallicity across the entire temperature range is supported by the presence of T7/2 terms in the resistivity data due to two-magnon scattering. Arrhenius equation fitting of the electrical resistivity data in the non-metallic regime results the activation energy of 4.98 meV. At room temperature, the electrical resistivity is 1.372 mΩ-cm which is consistent with the values reported previously for other well-known half-metallic HAs. The observed results of HA in thin film form seems encouraging to us which could find its applications as a magnetic electrode for future spintronics.
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利用电传输测量探测 Mn2CoSi/Si(100)薄膜结构中的半金属性,以实现自旋电子应用
为了探索薄膜形式的 Mn₂CoSi(MCS) Heusler 合金(HA)半金属性的可能性,我们研究了 Mn₂CoSi(MCS)薄膜的结构、磁性和电子传输特性。掠入射 X 射线衍射(GIXRD)数据表明,存在空间群为 R 3‾(148) 的斜方晶体结构。X 射线反射率(XRR)光谱拟合表明,沉积薄膜表面光滑,密度均匀。磁性分析表明薄膜具有铁磁性,转变温度远高于室温。MCS 薄膜的电传输研究表明,在不同的温度条件下,薄膜具有非金属特性(250 K)和金属特性(250 K)。由于双磁子散射,电阻率数据中出现了 T7/2 项,这支持了半金属性在整个温度范围内的持续性。阿伦尼乌斯方程拟合了非金属状态下的电阻率数据,得出活化能为 4.98 meV。室温下的电阻率为 1.372 mΩ-cm,与之前报告的其他著名半金属砷化镓的电阻率值一致。我们对薄膜形式的 HA 的观察结果感到鼓舞,它可以作为磁电极应用于未来的自旋电子学。
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来源期刊
Journal of Physics and Chemistry of Solids
Journal of Physics and Chemistry of Solids 工程技术-化学综合
CiteScore
7.80
自引率
2.50%
发文量
605
审稿时长
40 days
期刊介绍: The Journal of Physics and Chemistry of Solids is a well-established international medium for publication of archival research in condensed matter and materials sciences. Areas of interest broadly include experimental and theoretical research on electronic, magnetic, spectroscopic and structural properties as well as the statistical mechanics and thermodynamics of materials. The focus is on gaining physical and chemical insight into the properties and potential applications of condensed matter systems. Within the broad scope of the journal, beyond regular contributions, the editors have identified submissions in the following areas of physics and chemistry of solids to be of special current interest to the journal: Low-dimensional systems Exotic states of quantum electron matter including topological phases Energy conversion and storage Interfaces, nanoparticles and catalysts.
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