P. Matusche , O. Nuyken , B. Voit , M. Van Damme , J. Vermeersch , W. De Winter , L. Alaerts
{"title":"Water-soluble photoresins based on polymeric azo compounds","authors":"P. Matusche , O. Nuyken , B. Voit , M. Van Damme , J. Vermeersch , W. De Winter , L. Alaerts","doi":"10.1016/0923-1137(94)00093-K","DOIUrl":null,"url":null,"abstract":"<div><p>Polymeric azosulfonates lose their water solubility when exposed to UV light due to decomposition of the azo function. This effect can be used in water-based photoprinting processes. Water-soluble copolymers of azosulfonate containing repeat units and methyl methacrylate have been alternatively synthesized by a polymer-analogous reaction [1,2] and by direct copolymerization [3]. Both polymer types have been evaluated for application as photoresins in offset printing processes. The polymer made by copolymerization is superior and shows excellent results for photosensitivity, resolution, film-forming properties, and development in water, as well as for thermal and moisture storage stability.</p></div>","PeriodicalId":20864,"journal":{"name":"Reactive Polymers","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1995-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0923-1137(94)00093-K","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Reactive Polymers","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/092311379400093K","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
Abstract
Polymeric azosulfonates lose their water solubility when exposed to UV light due to decomposition of the azo function. This effect can be used in water-based photoprinting processes. Water-soluble copolymers of azosulfonate containing repeat units and methyl methacrylate have been alternatively synthesized by a polymer-analogous reaction [1,2] and by direct copolymerization [3]. Both polymer types have been evaluated for application as photoresins in offset printing processes. The polymer made by copolymerization is superior and shows excellent results for photosensitivity, resolution, film-forming properties, and development in water, as well as for thermal and moisture storage stability.
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