介质纳米层及多层涂层发射体的研究

D. Burda, Mohammad M. Allaham, M. Horáček, A. Knápek
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引用次数: 0

摘要

报道了一种单尖端场致发射体多层涂层的制备方法。钨场发射体涂覆多层难熔氧化物,如Al2O3、HfO2,在金属真空系统中充当额外的电位屏障。在发射体的金属真空界面系统中引入额外的障壁可以改变其发射特性。利用低温原子层沉积的方法制备了薄的氧化物屏障。利用局部电子原子探针层析成像、场离子显微镜和扫描透射显微镜对生长层的参数进行了研究。
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Study of Dielectric Nanolayers and Multilayer Coated Emitters
We report a fabrication method of multilayer coating of single tip field emitters. Tungsten field emitters coated with a multilayer of refractory oxides such as Al2O3, HfO2, which act as an additional potential barrier in the metal-vacuum system. Introducing additional barriers to the emitter's metal vacuum interface system can alter its emission characteristics. Thin oxide barriers were prepared using a recipe that involved the use of low-temperature atomic layer deposition. The parameters of the grown layers were studied by local electron atom probe tomography, field ion microscopy, and scanning transmission microscopy.
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Integrated Silicon Electron Source for High Vacuum Mems Devices Effects of DC Bias on Quantum Pathways Interference in Two-Color Laser Induced Photoemission Beta Factor Mapping of Individual Emitting Tips During Integral Operation of Field Emission Arrays Miniature Mass Spectrometers for On-Site Chemical Analysis Study of Dielectric Nanolayers and Multilayer Coated Emitters
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