磁控溅射制备二氧化铈涂层的性能研究

A. S. Baikin, E. O. Nasakina, A. Kolmakov, K. V. Sergienko, M. Sudarchikova, M. Sevostyanov
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引用次数: 0

摘要

基于CeO2的涂料具有一系列独特的性能,长期以来在许多行业中得到应用。但它们的潜在应用范围同样广泛,特别是考虑到新性质的发现。磁控管沉积技术扩大了基于CeO2的涂层的可能应用领域,使获得各种尺寸和几何形状的产品成为可能。本文综述了二氧化铈涂层磁控溅射工艺参数及其与涂层结构和关键性能的关系。考虑了靶材类型、溅射介质中氧的引入、溅射功率、偏置电压、衬底类型及其温度的变化对结构、力学性能和疏水性的影响。
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Properties of coatings based on cerium dioxide produced by magnetron sputtering
The unique set of properties of coatings based on CeO2 has long been used in many industries. But the range of their potential application is no less wide, especially in view of the discovery of new properties. Magnetron deposition technology expands the area of possible application of coatings based on CeO2, making it possible to obtain products of various sizes and geometries. This review presents the parameters of magnetron sputtering of coatings based on cerium dioxide, their relationship with the structure and key properties of these coatings. The influence of the type of target, the introduction of oxygen into the sputtering medium, changes in the sputtering power, bias voltage, type of substrate and its temperature on the structure, mechanical properties, and hydrophobicity are considered.
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