含阴极静态畴的梯度隙和异质结二极管的静态特性

O. Botsula, K. Prykhodko
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引用次数: 3

摘要

考虑了形成阴极静态畴并发生冲击电离的短长度二极管。二极管的特点是在阴极接触和不同组成的区域使用异质结。利用蒙特卡罗技术对二极管的工作进行了分析。研究了掺杂分布对二极管电流电压特性的影响。得到了载流子浓度和电场分布。确定了阴极静态畴参数与二极管结构和电压偏置的关系。影响畴参数的主要因素是阴极中浓度区大小过小。证明了冲击电离作为电子能量松弛机制的作用。
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Static characteristics of the graded gap and heterojunction diodes containing the cathode static domain
The short length diode with forming cathode static domain and occurring impact ionization are considered. The diode peculiarity is the usage of heterojunction on cathode contact and region with varying composition. The analysis of the diodes operation was performed using Monte Carlo technique. The influence of doping profile on diode current - voltage characteristic is investigated. The carriers concentration and electric field distribution are obtained. The cathode static domain parameters depending on diode structure and voltage bias are determined. The main influence on domain parameters is caused by low concentration region size in the cathode. The role of impact ionization as electrons energy relaxation mechanism has been demonstrated.
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