用阴影遮挡生长实现集成光学的高级结构

J. Blondelle, I. Moerman, P. D. De Dobbelaere, P. van Daele, P. Demeester
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引用次数: 4

摘要

在半导体材料中制造集成光学器件需要先进的加工技术。在本文中,我们提出了遮蔽阴影生长(SMG)作为替代其他技术,如多步蚀刻,质量输运,选择性生长,遮蔽阴影蚀刻等。将描述两种应用:折射透镜和锥形结构。该透镜可以很容易地与led或垂直腔基板发射激光二极管集成,或可用于实现3-D微腔。锥形结构在光学模形变压器(例如用于改进波导光纤耦合)和带隙工程(当使用量子阱时)中发现了有趣的应用。
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Advanced Structures For Integrated Optics Realized With Shadow Masked Growth
The fabrication of integrated optic devices in semiconductor materials requires advanced processing techniques. In this paper, we propose the shadow masked growth (SMG) as an alternative to other techniques such as multi-step etching, mass transport, selective growth, shadow masked etching, etc. Two applications will be described: refractive lenses and tapered structures. The lenses can easily be integrated with LEDs or vertical cavity substrate-emitting laser diodes, or can be used for the realisation of 3-D microcavities. The tapered structures find interesting applications in optical mode shape transformers (e.g. for improved waveguide fibre coupling) and in bandgap engineering (when using quantum wells).
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