使用阿贝正弦条件来量化光学成像系统中的对准像差

J. Burge, Chunyu Zhao, S. Lu
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引用次数: 21

摘要

众所周知,违反阿贝正弦条件会导致轴对称成像系统中的彗差,通常任何违反正弦条件(OSC)的行为都会导致与视场角度线性相关的像差。一个校正良好的成像系统必须符合阿贝正弦条件。一个不对准的光学系统可以有特殊形式的OSC,在这里进行评估。最低阶的非琐碎的影响,不对准有二次瞳孔依赖,导致散光和焦点的组合,有线性场依赖。复杂系统中可能出现高阶项,但不对准的影响几乎总是由最低阶效应主导,最低阶效应可以通过测量轴上图像和对正弦条件的轴上进攻来充分表征。通过了解轴上图像的形式和OSC,可以确定对齐状态。
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Use of the Abbe sine condition to quantify alignment aberrations in optical imaging systems
Violation of Abbe's sine condition is well-known to cause coma in axisymmetric imaging systems, and generally any offense against the sine condition (OSC) will cause aberrations that have linear dependence on the field angle. A well-corrected imaging system must obey the Abbe sine condition. A misaligned optical system can have particular forms of the OSC which are evaluated here. The lowest order non-trivial effects of misalignment have quadratic pupil dependence which causes a combination of astigmatism and focus that have linear field dependence. Higher order terms can arise from complex systems, but the effects of misalignment are nearly always dominated by the lowest order effects which can be fully characterized by measuring images on axis and the on-axis offense against the sine condition. By understanding the form of the on-axis images and the OSC, the state of alignment can be determined.
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