Color filtering metallization for optoelectronic 100nm CMOS circuits

We show a novel color filter system that can be implemented in a standard CMOS process without any additional chemicals and processing, using standard CMOS metals like aluminum. The filter uses sub-wavelength aperture and grating arrays allowing some light wavelengths through while blocking others. Furthermore, we show an integrated photo-detector, both as a standard junction diode and an MSM diode which combines the filters and detector into the simplest color imaging system. The experimental data is explained with simulations and electromagnetic theory.