电化学蚀刻制备三维硅基光子晶体

First IEEE International Conference on Group IV Photonics, 2004. Pub Date : 2004-09-29 DOI:10.1109/GROUP4.2004.1416723

S. Matthias, F. Muller, R. Hillebrand, J. Schilling, U. Gosele

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引用次数: 2

摘要

我们展示了一个通用的概念，以几乎完美的三维形状构造标准硅晶圆，这是通用的，准确的和快速的。为了表征，我们生长了具有完整光子带隙的光子晶体。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Three-dimensional silicon-based photonic crystals fabricated by electrochemical etching

We show a general concept to structure standard silicon wafers with an almost perfect three-dimensional shape, which is versatile, accurate and fast. For characterisation we grow photonic crystals with a complete photonic bandgap.

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First IEEE International Conference on Group IV Photonics, 2004.

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