用于热磁/磁光记录的CoGdTb薄膜的磁性能

D. Hairston, M. Kryder
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引用次数: 0

摘要

用于磁光记录的非晶CoGd薄膜缺乏足够的矫顽力(HC)来支持亚微米畴。采用射频溅射法制备的低Tb取代非晶CoGdTb薄膜具有与CoGd薄膜相似的磁性能。然而,CoGdTb薄膜增加了HC,使它们能够支持亚微米结构域3,4。在各种溅射条件下制备了CoGdTb薄膜,并对其热磁/磁光记录应用进行了表征。测定了制备过程中衬底偏置电压(VBias)和氩气分压(PAr)的影响。
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Magnetic Properties of CoGdTb Thin Films for Thermo-Magnetic/Magneto-Optic Recording
Amorphous CoGd films proposed for magneto-optic recording1 lack sufficient coercivity, HC, to support sub-micron domains. Amorphous CoGdTb films having low Tb substitution and prepared by r.f. sputtering have magnetic properties similar to CoGd films2. However CoGdTb films have increased HC enabling them to support submicron domains3, 4. CoGdTb films were prepared under a variety of sputtering conditions and characterized for their thermomagnetic/magneto-optic recording application. The influence of substrate bias voltage, VBias, and argon partial pressure, PAr, used during fabrication were determined.
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