光热辐射显微镜下不同杂质掺杂砷化镓微缺陷的非接触观察

N. Mikoshiba, K. Tsubouchi, Y. Akutsu, T. Futatsuya, T. Kitano, H. Watanabe, T. Mizutani, J. Matsui
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引用次数: 0

摘要

作者利用光热辐射(PTR)显微镜测量了掺杂各种杂质的砷化镓中的微缺陷,以研究先前实验中发现的微缺陷的性质。使用的样品是Si, S, Te和zn掺杂的GaAs晶片。测量了PTR信号作为激发光波长的函数。作者发现PTR光谱有很强的掺杂依赖性。只有在掺si的GaAs中,PTR信号在λ处有一个明显的最大值,相当于900 nm。测量了不同砷化镓晶圆的PTR形貌,并与光致发光形貌进行了比较。实验结果表明,尽管微缺陷的性质仍然不确定,但DTR技术为砷化镓中的非辐射微缺陷提供了重要而独特的信息。
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Noncontact observation of microdefects in GaAs doped with various impurities by photo-thermal-radiation microscope
The authors measured microdefects in GaAs doped with various impurities by a photo-thermal-radiation (PTR) microscope to investigate the nature of microdefects found in previous experiments. The samples used were Si-, S-, Te-, and Zn-doped GaAs wafers. The PTR signals were measured as a function of the wavelength of excitation light. The authors found a strong dopant dependence of the PTR spectra. The PTR signal has a clear maximum at lambda equivalent to 900 nm only in Si-doped GaAs. The authors measured the PTR topographs in various GaAs wafers and compared them with photoluminescence topographs. The experimental results showed that the DTR technique gives important and unique information on the nonradiative microdefects in GaAs, although the nature of the microdefects is still uncertain.<>
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