A. Phommahaxay, G. Lissorgues, T. Bourouina, P. Nicole
{"title":"真空微电子元件的单掩模制造工艺及初步表征结果","authors":"A. Phommahaxay, G. Lissorgues, T. Bourouina, P. Nicole","doi":"10.1109/IVNC.2005.1619639","DOIUrl":null,"url":null,"abstract":"In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.","PeriodicalId":121164,"journal":{"name":"2005 International Vacuum Nanoelectronics Conference","volume":"60 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Single mask fabrication process of vacuum microelectronics components and preliminary characterization results\",\"authors\":\"A. Phommahaxay, G. Lissorgues, T. Bourouina, P. Nicole\",\"doi\":\"10.1109/IVNC.2005.1619639\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.\",\"PeriodicalId\":121164,\"journal\":{\"name\":\"2005 International Vacuum Nanoelectronics Conference\",\"volume\":\"60 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2005 International Vacuum Nanoelectronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVNC.2005.1619639\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 International Vacuum Nanoelectronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVNC.2005.1619639","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Single mask fabrication process of vacuum microelectronics components and preliminary characterization results
In using a single mask fabrication process, our work enables the rapid prototyping of vacuum micro-components. The first prototypes, including lateral diodes and triodes, have been produced with a low-cost aluminum process, consisting of one metal layer, one lithography step and silicon micromachining. The effects of the process optimization on the characteristics will be assessed. Different configurations using more suitable field emitter materials such as tungsten will be studied in the future.
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