使用皮秒脉冲激光刺激40纳米CMOS技术的D触发器的SEU灵敏度和建模

C. Champeix, N. Borrel, J. Dutertre, B. Robisson, M. Lisart, A. Sarafianos
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引用次数: 13

摘要

本文介绍了CMOS 40 nm D触发器单元的设计,并报道了激光故障灵敏度映射的实验和仿真结果。这些研究是由需要提出一种基于激光/硅与复杂集成电路相互作用的模拟方法所驱动的。因此,在安全领域,必须了解像D触发器这样的敏感设备对激光刺激的行为。在之前的研究中,Roscian等人、Sarafianos等人、Lacruche等人或Courbon等人利用纳秒范围内的激光脉冲持续时间研究了细胞的布局、不同的激光敏感区域及其相关的故障模型之间的关系。在本文中,我们报告了使用更短的激光脉冲持续时间(30 ps而不是50 ns)进行的类似实验。我们还建议升级他们用来考虑由大量晶体管组成的逻辑门在皮秒范围内的激光脉冲持续时间的仿真模型,用于最新的CMOS技术(40 nm)。
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SEU sensitivity and modeling using pico-second pulsed laser stimulation of a D Flip-Flop in 40 nm CMOS technology
This paper presents the design of a CMOS 40 nm D Flip-Flop cell and reports the laser fault sensitivity mapping both with experiments and simulation results. Theses studies are driven by the need to propose a simulation methodology based on laser/silicon interactions with a complex integrated circuit. In the security field, it is therefore mandatory to understand the behavior of sensitive devices like D Flip-Flops to laser stimulation. In previous works, Roscian et al., Sarafianos et al., Lacruche et al. or Courbon et al. studied the relations between the layout of cells, its different laser-sensitive areas and their associated fault model using laser pulse duration in the nanosecond range. In this paper, we report similar experiments carried out using a shorter laser pulse duration (30 ps instead of 50 ns). We also propose an upgrade of the simulation model they used to take into account laser pulse durations in the picosecond range on a logic gate composed of a large number of transistors for a recent CMOS technology (40 nm).
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