研究在基于反向光刻技术的 90 纳米光掩膜生成中使用 U-Net、Erf-Net 和 DeepLabV3 架构的效率

{"title":"研究在基于反向光刻技术的 90 纳米光掩膜生成中使用 U-Net、Erf-Net 和 DeepLabV3 架构的效率","authors":"I. M. Karandashev, G. S. Teplov, A. A. Karmanov, V. Keremet, A. Kuzovkov","doi":"10.3103/s1060992x23040094","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":721,"journal":{"name":"Optical Memory and Neural Networks","volume":"127 2","pages":""},"PeriodicalIF":1.0000,"publicationDate":"2023-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigating the Efficiency of Using U-Net, Erf-Net and DeepLabV3 Architectures in Inverse Lithography-based 90-nm Photomask Generation\",\"authors\":\"I. M. Karandashev, G. S. Teplov, A. A. Karmanov, V. Keremet, A. Kuzovkov\",\"doi\":\"10.3103/s1060992x23040094\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":721,\"journal\":{\"name\":\"Optical Memory and Neural Networks\",\"volume\":\"127 2\",\"pages\":\"\"},\"PeriodicalIF\":1.0000,\"publicationDate\":\"2023-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Memory and Neural Networks\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3103/s1060992x23040094\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Memory and Neural Networks","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3103/s1060992x23040094","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"OPTICS","Score":null,"Total":0}