用于间接处理大肠杆菌的常压纳秒脉冲表面 DBD 等离子体的原位傅立叶变换红外光谱和激光诱导荧光 RONS 表征

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL Plasma Chemistry and Plasma Processing Pub Date : 2024-01-08 DOI:10.1007/s11090-023-10442-8
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引用次数: 0

摘要

摘要 我们研究了纳秒高压脉冲驱动的表面介质阻挡放电低温等离子体的杀菌效果。在距离等离子体表面 1.5 厘米处,经过 10 分钟处理后,我们发现大肠杆菌的数量减少了 4 个菌落。为了研究造成杀菌效果的活性氧和氮物种(RONS),我们采用了原位傅立叶变换红外(FTIR)光谱来测量一些相关物种,如 O (_3)、NO (_2)、N (_2)O 和 N (_2)O (_5)。测量是在各种相对湿度条件下进行的,以复制细菌处理环境。虽然检测到了源于氮化学的 RONS,但由于傅立叶变换红外检测的灵敏度限制,没有检测到硝酸盐生成过程中的关键分子一氧化氮(NO)。为了克服这一限制,我们利用皮秒脉冲激光诱导荧光来测量等离子体产生一氧化氮的动力学。我们的结果表明,氮氧化物的浓度小于 1 ppm,主要集中在等离子体表面附近,浓度随相对湿度成比例增加。值得注意的是,在距离等离子体表面 1.5 厘米处,即处理大肠杆菌的地方,NO 的浓度低于 50 ppb。虽然氮氧化物在等离子体内产生二次反应物方面起着关键作用,但我们的研究结果表明,它并不直接参与细菌的灭活过程。相反,在间接血浆处理中观察到的杀菌特性可能是由其他分子造成的,如浓度较高的 O (_3)、NO (_2)和 N (_2)O。
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In-Situ FTIR and Laser Induced Fluorescence RONS Characterization of Atmospheric Pressure Nanosecond-Pulsed Surface DBD Plasma for Indirect Treatments of E. Coli

Abstract

We study the bactericidal efficacy of surface dielectric barrier discharge low-temperature plasma treatments, powered by nanosecond high voltage pulses. We achieve \(\sim \) 4-log reduction in Escherichia coli population, after 10 min treatments, at a distance of 1.5 cm from the plasma surface. To investigate the reactive oxygen and nitrogen species (RONS) responsible for the bactericidal effect, we employ in-situ fourier transform infrared (FTIR) spectroscopy to measure a selection of relevant species, such as O \(_3\) , NO \(_2\) , N \(_2\) O and N \(_2\) O \(_5\) . The measurements are taken under various relative humidity conditions to replicate the bacteria treatment environment. While RONS originating from nitrogen chemistry are detected, nitric oxide (NO), a pivotal molecule in nitrate production, is absent due to the sensitivity limitations of FTIR detection. To overcome this limitation, we employ laser induced fluorescence utilizing a picosecond-pulsed laser to measure the kinetics of NO produced by the plasma. Our results show that the NO concentration is smaller than 1 ppm and primarily localized near the plasma surface, with concentrations increasing proportionally with relative humidity. Notably, at a distance of 1.5 cm from the plasma surface, at which the E. coli is treated, the concentration of NO falls below 50 ppb. Although NO is pivotal in generating secondary reactive species within the plasma, our results suggest that it does not directly contribute to the bacteria inactivation process. Instead, other molecules, such as O \(_3\) , NO \(_2\) , and N \(_2\) O, which are found in higher concentrations, may be responsible for the bactericidal properties observed in indirect plasma treatments.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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