利用流动回路进行石蜡沉积实验研究

IF 4.9 3区 工程技术 Q1 ENGINEERING, CHEMICAL Reviews in Chemical Engineering Pub Date : 2024-04-03 DOI:10.1515/revce-2023-0041
Chang Hong Gao
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引用次数: 0

摘要

生产井和石油管道中的蜡/石蜡沉积是石油生产的一大挑战。为了加深对这一过程的理解,人们进行了广泛的研究。本文回顾了利用流动回路开展的实验工作。以往的研究调查了温度、流速/速度、剪切应力、水分量、气相、管道材料、沥青质浓度和化学抑制剂影响下的石蜡沉积过程。测试结果表明,温度和剪切应力对蜡沉积有显著影响。有关多相流下蜡沉积的研究十分有限。尽管我们已在蜡沉积研究方面花费了 20 多年的时间,但遗憾的是,我们尚未完全了解这一现象。
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Experimental research of paraffin deposition with flow loops
Wax/paraffin deposition in production wells and oil pipelines is a major challenge for oil production. Extensive research has been conducted to improve understanding of this process. This paper presents a review of experimental work carried out with flow loops. Previous research investigated paraffin deposition process under the influences of temperature, flow rate/velocity, shear stress, water fraction, gas phase, pipe material, asphaltene concentration, and chemical inhibitors. Test results reveal that temperature and shear stress have significant impacts on wax deposition. Limited research has been conducted on wax deposition under multiphase flow. Even though more than 20 years of efforts have been spent on wax deposition studies, unfortunately we have not fully understood this phenomenon.
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来源期刊
Reviews in Chemical Engineering
Reviews in Chemical Engineering 工程技术-工程:化工
CiteScore
12.30
自引率
0.00%
发文量
37
审稿时长
6 months
期刊介绍: Reviews in Chemical Engineering publishes authoritative review articles on all aspects of the broad field of chemical engineering and applied chemistry. Its aim is to develop new insights and understanding and to promote interest and research activity in chemical engineering, as well as the application of new developments in these areas. The bimonthly journal publishes peer-reviewed articles by leading chemical engineers, applied scientists and mathematicians. The broad interest today in solutions through chemistry to some of the world’s most challenging problems ensures that Reviews in Chemical Engineering will play a significant role in the growth of the field as a whole.
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