异质结构 g-C3N4/Bi2WO6 复合材料作为高效光催化剂用于硫醇到二硫化物的选择性大气氧化。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-10-03 DOI:10.1021/acsami.4c11091
Yanxia Shen, Haibo Zhu, Liya Deng, Liu Yang, Yajing Shen, Qiangwen Fan, Zhanggao Le, Zongbo Xie
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引用次数: 0

摘要

提高光载体的传输和分离效率被认为是提高半导体光催化催化性能的有效方法。在此,我们报告了 g-C3N4/Bi2WO6 异质结构纳米片的合成和应用,用于在可见光照射下将硫醇光催化偶联为二硫化物。与裸催化剂相比,异质结表现出显著的光催化性能,由于 g-C3N4 具有显著的空穴捕获能力,它大大提高了光生电荷载流子的分离和转移。利用这种异质结构光催化体系有效地制备了各种功能性对称和不对称二硫化物,它们具有优异的光催化活性和循环稳定性。半导体异质结催化剂出色的光催化活性为生产二硫化物提供了一种经济、可持续的绿色工艺。
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Heterostructured g-C3N4/Bi2WO6 Composites as Highly Efficient Photocatalysts for Selective Atmospheric Oxidation of Thiols to Disulfides.

Improving the transmission and separation efficiency of light carriers is considered an effective method to enhance the catalytic performance of semiconductor photocatalysis. Herein, we report the synthesis and application of g-C3N4/Bi2WO6 heterostructure nanosheets for the photocatalytic coupling of thiols to disulfides under visible light irradiation. The heterojunction exhibits significant photocatalytic performance compared to the bare catalyst, which dramatically enhances the separation and transfer of photogenerated charge carriers due to the remarkable hole-trapping ability of g-C3N4. Various functional symmetrical and asymmetrical disulfides have been effectively prepared by employing this heterostructure photocatalytic system, which features excellent photocatalytic activity and cycling stability. The outstanding photocatalytic activity of the semiconductor heterojunction catalyst provides an economical, sustainable, and thus green process for producing disulfides.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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