微反应器辅助软光刻快速和廉价的纳米结构ZnO/CuO异质结图像化

IF 3.4 3区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Advanced Engineering Materials Pub Date : 2024-12-04 DOI:10.1002/adem.202470065

Zhongwei Gao, V. Vinay K. Doddapaneni, Changqing Pan, Rajiv Malhotra, Chih-hung Chang

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引用次数: 0

摘要

在文章编号2401112中，张志宏和他的同事展示了一种新的微反应器辅助软光刻工艺，可以沉积具有多尺度三维几何形状的纳米结构，并用n型ZnO和p型CuO制备p-n异质结。基于COMSOL仿真和实验结果，研究了影响打印过程的因素。这种新颖的工艺可以使用低成本和简单的基于溶液的方法在所需区域上可扩展地制造复杂的功能纳米结构。

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Microreactor-Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions

Microreactor-Assisted Soft Lithography

In article number 2401112, Chih-hung Chang and co-workers demonstrate a novel microreactor-assisted soft lithography process to deposit nanostructures with multiscale 3D geometric shapes and fabricate p-n heterojunction with n-type ZnO and p-type CuO. Factors determining the printing process are studied based on COMSOL simulation and experimental results. This novel process enables the scalable fabrication of complicated functional nanostructures on the desired regions using low-cost and facile solution-based methods.

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来源期刊

Advanced Engineering Materials 工程技术-材料科学：综合

CiteScore

5.70

自引率

5.60%

发文量

544

审稿时长

1.7 months

期刊介绍： Advanced Engineering Materials is the membership journal of three leading European Materials Societies - German Materials Society/DGM, - French Materials Society/SF2M, - Swiss Materials Federation/SVMT.

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