细菌细胞DNA修复合成过程中染色体与膜附加接触的形成。

V G Bezlepkin, Malinovsky YuYu, A I Gaziev
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引用次数: 0

摘要

与未处理的细胞相比,与紫外线诱导的DNA修复合成相比,在枯草芽孢杆菌细胞中发现膜结合DNA的数量增加。结果表明,DNA修复合成发生在紫外线照射下形成的DNA膜复合物(DMC)中。在具有修复损伤DNA能力的野生型菌株的细胞中观察到DMC的形成,而在DNA-聚合酶I突变体中则没有。这表明DNA-聚合酶I位于枯草芽孢杆菌细胞的膜上。这表明dna聚合酶I参与了紫外线照射细胞中染色体与膜的结合。当细胞被dna旋切酶抑制剂处理时,紫外线诱导的DMC不解离。因此,它在质量上不同于复制过程中发现的DMC。讨论了紫外线照射下枯草芽孢杆菌细胞中受损DNA与膜结合的机制。
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Formation of additional contacts of chromosome with membrane in the process of DNA repair synthesis in bacterial cells.

An increase in the amount of membrane-bound DNA was found in B. subtilis cells with UV-induced DNA repair synthesis as compared to untreated cells. It was shown that DNA repair synthesis occurred in DNA membrane complexes (DMC) formed during UV-irradiation. UV-induced formation of DMC was observed in cells of wild type strains which were capable of repairing damaged DNA but not in a mutant defective in DNA-polymerase I. It was demonstrated that DNA-polymerase I is located on the membrane of B. subtilis cells. This suggested a participation of DNA-polymerase I in binding of the chromosome to the membrane in UV-irradiated cells. UV-induced DMC did not dissociate when the cells were treated with inhibitors of DNA-gyrase. It, therefore, was qualitatively different from the DMC found during replication. The mechanisms of binding of the damaged DNA to the membrane in UV-irradiated cells of B. subtilis are discussed.

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