采用介质电泳技术的金属碳纳米管容容场效应晶体管

IF 1.8 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY IEEE Open Journal of Nanotechnology Pub Date : 2023-03-13 DOI:10.1109/OJNANO.2023.3256410
Shobhit Kareer;Jeongwon Park
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引用次数: 0

摘要

硅基晶体管的性能已经达到极限,碳纳米管(CNTs)等新材料已经开始在电子产品中取代它们。然而,精确操作碳纳米管需要复杂的技术,这增加了工艺的变化。这些变化会导致场效应晶体管(FET)的总产率下降。这项研究显示了低频信号如何在纳米尺度上调节电极上碳纳米管的数量。我们还演示了使用交叉指状电极来减少由金属碳纳米管引起的短路。利用SEM, AFM和I-V测量对制备的cnfet进行了表征。该研究还展示了施加信号的持续时间和振幅如何影响电极上碳纳米管的密度。最后,使用有限元分析来评估DEP过程中的电场参数。该技术将导致每单位面积上精确的碳纳米管,这有助于制造晶体管、传感器和其他电子元件。
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Metallic CNT Tolerant Field Effect Transistor Using Dielectrophoresis
The performance of silicon-based transistors is reaching its limit, and new materials like carbon nanotubes (CNTs) have started emerging to replace them in electronic products. However, the precise manipulation of CNTs requires complicated techniques, which increases process variation. These variations can lead to a decrease in the overall yield of the field-effect transistor (FET). This study shows how a low-frequency signal may regulate the number of CNTs on electrodes with a nanometer scale. We also demonstrate using an interdigitated electrode to reduce the shorts caused by metallic CNTs. The fabricated CNFETs were characterized using SEM, AFM, and I-V measurements. The study also demonstrates how the duration and amplitude of the applied signal impact the density of CNTs on the electrodes. Finally, finite element analysis was used to evaluate the electric field parameters during DEP. This technique will lead to precise CNTs per unit area, which can help fabricate transistors, sensors, and other electronic components.
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来源期刊
CiteScore
3.90
自引率
17.60%
发文量
10
审稿时长
12 weeks
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