Fábia Rvo Roma, Karla Js Penha, Carlos Rg Torres, Etevaldo M Maia-Filho, Leily M Firoozmand
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引用次数: 0
摘要
牙本质过敏是由于牙本质小管全部或部分暴露导致的牙本质渗透性增加而引起的,这反过来又可以由牙齿结构的改变或修复程序的失败引起。本体外研究的目的是评估不同种类的粘接剂系统在侵蚀前和侵蚀后防止牙本质渗透的效果。制备牛牙本质圆盘50个(6x1 mm),分为5组(n=10):(SB2) Single Bond 2, (SBU) Universal Single Bond, (CSB) Clearfil SE Bond, (SM) Scotchbond Multipurpose, (C) Control。记录粘接后(HC-1)和侵蚀后(HC-2)牙本质的水力导度。通过扫描电镜(SEM)获得处理后和侵蚀后牙本质表面图像。数据分析采用Kruskal Wallis、Mann-Whitney、Bonferroni校正和Wilcoxon检验(p0.05)。常规、自蚀刻和通用胶粘剂系统使牙本质渗透性降低80%以上,牙本质脱矿可能有助于提高通用和自蚀刻系统的渗透性。
Assessment of permeability of eroded dentin after the use of universal, self-etch, and conventional systems.
Dentin hypersensitivity is caused by increased dentinal permeability due to total or partial exposure of dentinal tubules, which in turn can be produced by alterations of dental structures or failure of restorative procedures. The purpose of this in vitro study was to evaluate the efficacy of the application of different kinds of adhesive systems to prevent dentin permeability before and after an erosive challenge. Fifty bovine dentin discs (6x1 mm) were prepared and the specimens were divided into 5 groups (n=10): (SB2) Single Bond 2, (SBU) Universal Single Bond, (CSB) Clearfil SE Bond, (SM) Scotchbond Multipurpose and (C) Control. Hydraulic conductance of dentin was recorded after adhesive application (HC-1) and after erosive challenge (HC-2). Dentin surface images of post-treatment and post-erosive challenge were obtained by scanning electron microscopy (SEM). Data were analyzed using Kruskal Wallis, Mann-Whitney with Bonferroni correction and Wilcoxon tests (p<0.05). Reduction in dentin permeability was observed with the application of adhesive systems (p<0.05). After the erosive challenge, dentin permeability increased for SBU and CSB (p<0.05), while SB2 and SM did not differ in HC-1 or HC-2 (p>0.05). The conventional, self-etching and universal adhesive systems reduce dentinal permeability by more than 80%, and dentin demineralization may contribute to the increased permeability of universal and self-etching systems.