激光能量对脉冲激光沉积掺钕氧化锌铟薄膜性能的影响

IF 3.3 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Superlattices and Microstructures Pub Date : 2021-12-01 DOI:10.1016/j.spmi.2021.107059
Xiao Fu , Rihui Yao , Zhihao Liang , Dongxiang Luo , Zhuohui Xu , Yilin Li , Nanhong Chen , Chunyuan Hu , Honglong Ning , Junbiao Peng
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引用次数: 4

摘要

掺钕氧化铟锌是一种具有高迁移率和巨大应用潜力的透明电子器件材料。采用脉冲激光沉积法(PLD)分别在250、350、450和550 mJ/脉冲激光能量下制备了NIZO薄膜。随着激光能量的增加,薄膜由非晶态逐渐转变为非晶/晶态,In2O3晶体在(123)平面上优先生长。在可见光范围内,薄膜的平均透过率高于80%。当激光能量为250 mJ时,载流子迁移率最高,为14.43 cm2 V−1 s−1,随激光能量的增加而减小。这种现象的可能原因是电子结构和结晶。根据缺陷态的含量和发射粒子数,分析了薄膜的载流子浓度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Effect of laser energy on the properties of neodymium-doped indium zinc oxide thin films deposited by pulsed laser deposition

The neodymium (Nd) doped indium-zinc-oxide (NIZO) is a material with high mobility and great potential in transparent electronic devices. NIZO thin films were prepared by pulsed laser deposition (PLD) at 250, 350, 450, and 550 mJ/pulse laser energy, respectively. With the increase of laser energy, the films gradually change from an amorphous to an amorphous/crystalline state and the In2O3 crystals have preferential growth in the (123) plane. The average transmittance of the film is higher than 80% in the visible range. When the laser energy is 250 mJ, the carrier mobility has the highest value of 14.43 cm2 V−1 s−1, and it decreases with the increase of laser energy. The possible reason for this phenomenon is given by electronic structure and crystallization. Based on the content of defect states and the emitted particle number, the carrier concentration of the films is analyzed.

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来源期刊
Superlattices and Microstructures
Superlattices and Microstructures 物理-物理:凝聚态物理
CiteScore
6.10
自引率
3.20%
发文量
35
审稿时长
2.8 months
期刊介绍: Micro and Nanostructures is a journal disseminating the science and technology of micro-structures and nano-structures in materials and their devices, including individual and collective use of semiconductors, metals and insulators for the exploitation of their unique properties. The journal hosts papers dealing with fundamental and applied experimental research as well as theoretical studies. Fields of interest, including emerging ones, cover: • Novel micro and nanostructures • Nanomaterials (nanowires, nanodots, 2D materials ) and devices • Synthetic heterostructures • Plasmonics • Micro and nano-defects in materials (semiconductor, metal and insulators) • Surfaces and interfaces of thin films In addition to Research Papers, the journal aims at publishing Topical Reviews providing insights into rapidly evolving or more mature fields. Written by leading researchers in their respective fields, those articles are commissioned by the Editorial Board. Formerly known as Superlattices and Microstructures, with a 2021 IF of 3.22 and 2021 CiteScore of 5.4
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