光学光刻

IF 3.3 Q3 NANOSCIENCE & NANOTECHNOLOGY Nanofabrication Pub Date : 2020-12-01 DOI:10.1201/b11626-8
Francesc Perez-Murano, José Ignacio Martín, J. D. de Teresa
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引用次数: 179

摘要

光学光刻的普遍使用是其高度并行性的直接结果,它允许在很短的时间内传输大量信息(即图案)。例如,考虑到现代前沿扫描仪的规格(每小时150个300mm晶片和40nm二维图案分辨率),可以发现像素吞吐量大约为每秒1.8T像素。可以说,这种能力促成了我们在过去50年中经历的计算革命。
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Optical lithography
Optical lithography’s ubiquitous use is a direct result of its highly parallel nature allowing vast amounts of information (i.e. patterns) to be transferred in a very short time. For example, considering the specification of a modern leading edge scanner (150 300-mm wafers per hour and 40-nm two-dimensional pattern resolution), the pixel throughput can be found to be approximately 1.8T pixels per second. This capability has arguably enabled the computing revolution we have undergone over the past 50 years.
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来源期刊
Nanofabrication
Nanofabrication NANOSCIENCE & NANOTECHNOLOGY-
自引率
10.30%
发文量
13
审稿时长
16 weeks
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