复合协同法制备ALD蜂窝锐钛矿膜

Chemical Vapor Deposition Pub Date : 2015-11-10 DOI:10.1002/cvde.201507183

Francesca Visentin, Naida El Habra, Monica Favaro, Simone Battiston, Rosalba Gerbasi, Laura Crociani, Alessandro Galenda

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引用次数: 2

摘要

具有高表面体积比的大孔无机结构已成为许多领域的研究热点。在这里，我们的注意力集中在一种混合协同方法上，以制备具有增加比表面积的蜂窝(HC)锐钛矿TiO2薄膜。利用呼吸图(BFs)方法生产HC聚苯乙烯(PS)模板，并使用原子层沉积(ALD)在其上覆盖TiO2涂层。在有机/无机杂化材料转化为锐钛矿晶体薄膜的过程中，测试了不同的方法来保持HC-TiO2结构。在预uv交联底物上使用ALD在180°C下操作获得最佳结果。

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Hybrid Synergic Methodology to Prepare ALD Honey-Comb Anatase Films

Macroporous inorganic structures with high surface-to-volume ratio have been recognized as a centre of interest in many fields. Here, attention is focused on a hybrid synergic methodology to prepare honey-comb (HC) anatase TiO₂ films with increased specific surface area. The breath figures (BFs) method is exploited to produce HC polystyrene (PS) templates and atomic layer deposition (ALD) is used to conformally cover them with a TiO₂ coating. Different approaches are tested to preserve the HC-TiO₂ structure during the conversion of the hybrid organic/inorganic materials into crystalline anatase films. Best results are obtained operating with ALD at 180 °C on pre-UV cross-linked substrates.

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来源期刊

Chemical Vapor Deposition 工程技术-材料科学：膜

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0.00%

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审稿时长

>12 weeks

期刊介绍： Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.

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