光导和光敏聚合物的最新进展

M. Biswas, T. Uryu
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引用次数: 20

摘要

摘要近年来,由于电子照相及相关工艺对光导和光敏聚合物的需求不断增加,光导和光敏聚合物的合成和评价受到了相当大的关注。到目前为止,各种各样的聚合物,无论是未经改性的,还是化学改性的或其他改性的,都已被探索在这一领域的潜力。Stolka和Pai的权威评论讨论了光电导率的基本概念,总结了在此背景下常用的实验技术,并回顾了1976年可用的这些系统的原始和专利文献。在一篇当代文章中,Pen-well, Ganguly和Smith回顾了n-乙烯基-咔唑聚合物体系的文献,具体涉及合成,物理化学性质评估及其理论意义,以及相关主题。最近,Biswas和Das回顾了自1979年以来咔唑基聚合物体系的发展。
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Recent Advances in Photoconductive and Photosensitive Polymers
Abstract The synthesis and evaluation of photoconductive and photosensitive polymers have received considerable attention during recent years because of the increasing demand for such materials in electrophotography and related processes. By now, a wide variety of polymers, unmodified as well as modified chemically or otherwise, has been explored with regard to their potentialities in this field. An authoritative review by Stolka and Pai discussed the basic concepts in photoconductivity, summarizing the experimental techniques commonly employed in this context along with a review of original and patent literature on these systems available through 1976. In a contemporary article, Pen-well, Ganguly, and Smith reviewed the literature on N-vinyl -carbazole polymer systems with specific regard to synthesis, physicochemical property evaluation vis-a-vis their theoretical implications, and related topics. More recently, Biswas and Das reviewed the developments in carbazole-based polymer systems throusrh 1979.
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