流化分离基质上的OMCVD:一种有潜力的催化剂制备方法

R. Feurer, A. Reynes, P. Serp, P. Kalck, R. Morancho
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引用次数: 0

摘要

利用OMCVD方法在多孔分割的衬底上沉积高纯度的金属颗粒,制备了金属负载催化剂。特别设计了流化床反应器,考虑了气相沉积和流态化的要求,选择了方便的实验条件。选择了三种铑的金属有机化合物,用红外光谱和在线质谱分析研究了它们在He和He/H2混合物下的热分解。沉积是在总压力为100托和衬底温度低至100°C下进行的。用XPS对固体沉积物进行了表征,用化学吸附法和透射电镜测定了颗粒的大小和分散性。这些催化剂无需进一步处理即可使用,并与常规制备的催化剂进行了性能比较。
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OMCVD on Fluidized Divided Substrates : a Potential Method for the Preparation of Catalysts
The OMCVD method has been used to deposit highly pure metal particles on porous divided substrates in order to prepare metal supported catalysts. A fluidized bed reactor has been especially designed and the requirements of CVD and fluidization have been taken into account to select convenient experimental conditions. Three organometallic compounds of rhodium have been selected and their thermal decomposition under He and He/H2 mixtures studied by infrared spectroscopy and on-line mass spectrometry analyses. The deposition are carried out at a total pressure of 100 Torr and substrate temperatures as low as 100°C. The solid deposits have been characterized by XPS, the size and dispersion of the particules have been determined by chemisorption methods or measured by TEM. These catalysts can be used without further treatment and their performances have been compared to those of conventionally prepared ones.
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