沉积参数对直流反应磁控共溅射制备Ni0.5Co0.5Fe2O4纳米复合薄膜特性的影响

Tawfiq S. Mahdi, F. J. Kadhim
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引用次数: 6

摘要

本文采用直流反应双磁控共溅射技术制备尖晶石铁氧体(NiCoFe2O4)薄膜。研究了电极间距等操作参数和氩气与氧气混合比例等制备条件对制备样品结构和光谱特性的影响。对于电极间距为5 cm的样品,在FTIR光谱中只观察到一个OH-官能团,而所有的波段都属于金属-氧振动。同样,XRD结果表明,降低混合气体中氧的压力,在电极间距为5 cm处制备的样品中生长出更多的晶面。测定了混合比为65:35的样品,直接允许跃迁、直接禁止跃迁和间接允许跃迁的能带隙分别为2.7、2和3.35 eV。最终样品中除Co, Ni, Fe和O外,没有发现任何其他元素的痕迹,从而证实了高结构纯度。
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Effect depositions parameters on the characteristics of Ni0.5Co0.5Fe2O4 nanocomposite films prepared by DC reactive magnetron Co-Sputtering technique
In this work, spinel ferrites (NiCoFe2O4) were prepared as thin films by dc reactive dual-magnetron co-sputtering technique. Effects of some operation parameters, such as inter-electrode distance, and preparation conditions such as mixing ratio of argon and oxygen in the gas mixture, on the structural and spectroscopic characteristics of the prepared samples were studied. For samples prepared at inter-electrode distance of 5 cm, only one functional group of OH- was observed in the FTIR spectra as all bands belonging to the metal-oxygen vibration were observed. Similarly, the XRD results showed that decreasing the pressure of oxygen in the gas mixture lead to grow more crystal planes in the samples prepared at inter-electrode distance of 5 cm. The energy band gap was determined for the sample prepared with mixing ratio of 65:35 and found to be 2.7, 2 and 3.35 eV for direct allowed, direct forbidden and indirect allowed transitions, respectively. The high structural purity was confirmed as no traces for any elements other than Co, Ni, Fe and O were found in the final samples.
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