自旋镀膜技术研究Al掺杂ZnO薄膜的结构、形态、光学和电学性能

Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry Pub Date : 2016-04-02 DOI:10.1080/15533174.2014.988795

M. Yilmaz, D. Tatar, E. Sonmez, Ç. Çırak, Ş. Aydoğan, R. Gunturkun

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引用次数: 25

摘要

本研究采用溶胶-凝胶自旋镀膜技术合成了Al掺杂ZnO薄膜。为了研究Al掺杂对ZnO性能的影响，将Al掺杂浓度在0-5 mol%范围内变化。通过XRD、SEM、UV-VIS和四点探针等测试手段，研究了Al掺杂对ZnO薄膜结构、形貌、光学和电学性能的影响。所有的结果，无论是纯ZnO薄膜还是掺杂Al的ZnO薄膜，都被详细描述，表明本研究制备的薄膜可以用于许多纳米技术应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Investigation of Structural, Morphological, Optical, and Electrical Properties of Al Doped ZnO Thin Films Via Spin Coating Technique

In this study, Al doped ZnO thin films were synthesized by sol gel spin coating technique. To investigate the effect of Al doping on ZnO properties, Al doping concentration was diversified in the range of 0–5 mol%. The effect of Al doping on structural, morphological, optical and electrical properties of ZnO thin films was evaluated by XRD, SEM, UV-VIS and four point probe measurements. All results whether pure or Al doped ZnO thin films were described in detail and they indicated that the films prepared in this study can be used in many nanotechnological applications.

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Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry 工程技术-纳米科技

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5 months