Ga掺杂Zno纳米晶体的光学和形态学研究

A. George
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引用次数: 1

摘要

采用低成本的水解技术合成了球状氧化锌未掺杂和掺杂纳米晶体。通过x射线衍射分析来评价掺杂离子晶格参数的贡献。计算得到的晶粒尺寸与透射电镜结果吻合较好。对于原始样品,PL的性质是广泛的,在电磁波谱可见区的各个位置都有最大值。大多数ZnO样品的发射光谱表现为近带边缘线(λ=366 nm),其次是低能级(λ=453nm, 546nm和634nm)的深能级发光。在本例中,较高的能带(366nm)被分配给通过激子-激子碰撞过程发生的自由激子重组。Ga掺杂的发光光谱,发射峰分别在364 nm、442 nm、544 nm和635nm处。NBE的发射强度随着向低波长的偏移而减小,而442的发射强度随着向低波长的偏移而增加,同时由于其他本征缺陷引起的发射强度也被Ga掺杂抑制。这可能是由于掺杂样品的粒度减小所致。
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Optical and Morphological Studies of Ga Doped Zno Nanocrystals
ZnO undoped and doped nanocrystals with spherical morphology have been synthesized by à cost effective hydrolysis technique. X-ray diffraction analysis was carried out to evaluate the contribution of dopant ion lattice parameters. The crystallite size calculated is in good agreement with the TEM results. For pristine samples, PL is broad in nature with maxima at various positions in visible region of electromagnetic spectrum. The emission spectra of most ZnO sample show a near-band-edge line (λ=366 nm) followed by a deep level luminescence in lower energy regime (λ=453nm, 546nm and 634nm). In the present case, the higher energy band (366nm) is assigned to the occurrence of free excitons’ recombination through an exciton-exciton collision process. The Ga doped luminescence spectra, the emission peaks are at 364 nm,442 nm 544and 635nm. NBE emission had a decrement in the intensity along with shift towards lower wavelength and the 442 emission had a increase in intensity also the emission due to other intrinsic defects were depressed with Ga doping. This may be attributed to the decrease in particle size of doped samples.
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