提高电化学稳定性的电沉积钴涂层的电流密度诱导晶界工程

IF 1.5 4区材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Philosophical Magazine Pub Date : 2023-06-20 DOI:10.1080/14786435.2023.2221043

G. Kumar, Mrinal Phukon, C. Srivastava

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引用次数: 0

摘要

以不同的沉积电流密度(10 mA·cm−2、20 mA·cm−2、30 mA·cm−2、40 mA·cm−2、60 mA·cm−2)在低碳钢基体上电沉积钴镀层。在30 mA·cm−2下沉积的涂层由于具有较高比例的低能晶界结构(即重合点阵(csl)和低角度晶界(LAGB))和较高比例的稳定Co3O4被动氧化层，因此具有最高的耐蚀性(Rp = 7515Ω·cm2)。在60 mAcm−2条件下电沉积的镀层由于含有较多的高角度晶界和相对不稳定的Co(OH)2，其耐蚀性较低(Rp = 1304 Ω·cm2)。

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Deposition current density-induced grain boundary engineering of electrodeposited cobalt coatings for enhanced electrochemical stability

ABSTRACT Cobalt coatings were electrodeposited at different deposition current densities (10 mA·cm−2, 20 mA·cm−2, 30 mA·cm−2, 40 mA·cm−2, 60 mA·cm−2) over mild steel substrate. The coating deposited at 30 mA·cm−2 showed the highest corrosion resistance (Rp = 7515Ω·cm2) due to a higher fraction of Low energy grain boundary constitution (i.e. coincidence site lattices (CSLs) and low angle grain boundaries (LAGB)) and exhibited higher fraction of stabler Co3O4 passive oxide layer. The coatings electrodeposited at 60 mAcm−2 exhibited lower corrosion resistance (Rp = 1304 Ω·cm2) due to a higher fraction of high-angle grain boundaries and a higher fraction of relatively lesser stable Co(OH)2.

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来源期刊

Philosophical Magazine 工程技术-材料科学：综合

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审稿时长

4.7 months

期刊介绍： The Editors of Philosophical Magazine consider for publication contributions describing original experimental and theoretical results, computational simulations and concepts relating to the structure and properties of condensed matter. The submission of papers on novel measurements, phases, phenomena, and new types of material is encouraged.