用于1/4英寸PAL 430k像素IT-CCD的高灵敏度像素技术

A. Tsukamoto, W. Kamisaka, H. Senda, N. Niisoe, H. Aoki, T. Otagaki, Y. Shigeta, M. Asaumi, Y. Miyata, Y. Sano, T. Kuriyama, S. Terakawa
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引用次数: 7

摘要

针对1/4英寸430k (PAL)像素IT-CCD (Inter-line Transfer Charge Coupled Device),开发了一种新的像素技术。新的像素具有由硅化钨薄膜制成的薄遮光罩和由BPSG流预先定义的内层光学微透镜。该工艺可以将像素尺寸减小到22.6 /spl mu/m/sup 2/,提高了灵敏度,降低了涂抹值。与传统的像素技术相比,灵敏度提高了30%,涂抹值降低了6dB。这些特性可与传统的1/3英寸560k像素IT-CCD相媲美,像素尺寸为33.6 /spl mu/m/sup 2/。
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High sensitivity pixel technology for a 1/4-inch PAL 430 k pixel IT-CCD
A new pixel technology has been developed for a 1/4-inch 430 k (PAL) pixel IT-CCD (Inter-line Transfer Charge Coupled Device). The new pixel has a thin light shield made of tungsten silicide film and an inner-layer optical micro-lens pre-defined by BPSG flow. This process technology can reduce the pixel size to 22.6 /spl mu/m/sup 2/ with improved sensitivity and reduced smear value. The sensitivity is increased by 30% and the smear value is reduced by 6dB compared to a conventional pixel technology. These characteristics are comparable to a conventional 1/3-inch 560 k pixel IT-CCD with the pixel size of 33.6 /spl mu/m/sup 2/.
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